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Engineering substrates through wafer bonding
New engineering materials can be created through wafer bonding, with properties superior to single materials. But bonded materials often de-bond in high-temperature anneals because of mismatched coefficients of thermal expansion.
Through decades of research we developed a proprietary low-temperature anneal whose bond strength equals that of a high-temperature anneal. With wafer thinning and exfoliation technology, we have developed the substrates below.
Wafer foundry service
We provide wafer foundry services to the semiconductor and MEMS industries, ranging from single processes to advanced prototype products.
- 1
Thin film coating
Metal (Au, Cr, Al, Cu, Ni, Pt) thin film, SiO₂ and SiN by sputtering, evaporation and CVD.
Request - 2
Photolithography
Resist coating, contact and step exposure, develop. Lift-off process.
Request - 3
Electroplating and electroless plating
Cu, Ni, Au and solder for interconnect and wafer bumping.
Request - 4
Etching
Wet and dry etching.
Request - 5
Wafer bonding
Fusion, anodic, eutectic, polyimide and polymer bonding.
Request - 6
Dicing
Silicon and glass.
Request - 7
Grinding and polishing
Silicon wafer grinding and CMP polishing.
Request
Emerging technology
Interposers and through-via silicon and glass wafers
Interposers and through-via wafers draw on the same steps as our foundry service: bonding, thinning, plating and polishing. Tell us your via pitch, wafer thickness and metallization and we’ll quote it.
Discuss an interposer project →